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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
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Atomic Layer Deposition, Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, Arthur Sherman
- Taal
- Jaar van publicatie
- 2013
- Bindwijze
- (Hardcover)
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- Titel
- Atomic Layer Deposition
- Ondertitel
- Principles, Characteristics, and Nanotechnology Applications - 2nd Edition
- Taal
- Engels
- Uitgever
- Wiley-Scrivener
- Jaar van publicatie
- 2013
- Formaat
- Hardcover
- Aantal pagina's
- 272
- ISBN10
- 1118062779
- ISBN13
- 9781118062777
- Reeks
- Categorieën
- Tags
- Verenigde Staten, Technologie, Wetenschappelijke Theorien, Nanotechnologie, Toepassingen, Koning Arthur
- Aantekening
- Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.