Spectroscopic Ellipsometry for the In-situ Investigation of Atomic Layer Depositions

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Focusing on Atomic Layer Deposition (ALD), this report delves into its significance as a specialized Chemical Vapor Deposition (CVD) method. It highlights ALD's unique self-terminating sequential gas reactions, which enable conformal and precise material growth at the nanoscale. The surface-controlled nature of ALD is emphasized, along with its implications for process parameters. This detailed analysis is rooted in the context of semiconductor technology, showcasing the advancements and applications of ALD in the field.